- 专利标题： Illumination system for a microlithographic projection exposure apparatus
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申请号： US12190308申请日： 2008-08-12
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公开(公告)号： US08395756B2公开(公告)日： 2013-03-12
- 发明人: Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
- 申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT GmbH
- 当前专利权人： Carl Zeiss SMT GmbH
- 当前专利权人地址： DE Oberkochen
- 代理机构： Fish & Richardson P.C.
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; G03B27/42 ; G03B27/54 ; G03B27/72
摘要：
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.