Invention Grant
- Patent Title: Illumination system for a microlithographic projection exposure apparatus
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Application No.: US12190308Application Date: 2008-08-12
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Publication No.: US08395756B2Publication Date: 2013-03-12
- Inventor: Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
- Applicant: Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/54 ; G03B27/72
Abstract:
Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
Public/Granted literature
- US20090021716A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS Public/Granted day:2009-01-22
Information query
