发明授权
- 专利标题: Implantation of low-profile implantable medical device
- 专利标题(中): 植入低轮廓植入式医疗器械
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申请号: US10731868申请日: 2003-12-09
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公开(公告)号: US08397732B2公开(公告)日: 2013-03-19
- 发明人: Ruchika Singhal , Robert M. Skime , Carl D. Wahlstrand
- 申请人: Ruchika Singhal , Robert M. Skime , Carl D. Wahlstrand
- 申请人地址: US MN Minneapolis
- 专利权人: Medtronic, Inc.
- 当前专利权人: Medtronic, Inc.
- 当前专利权人地址: US MN Minneapolis
- 代理机构: Shumaker & Sieffert, PA
- 代理商 John W. Albrecht
- 主分类号: A61B19/00
- IPC分类号: A61B19/00
摘要:
In general, the invention is directed to techniques for implantation of a low-profile implantable medical device (IMD) in the body of a patient. In an exemplary embodiment, the low-profile IMD is implanted under the scalp. When the treatment or monitoring site is in or on the head of the patient, the low-profile IMD can be implanted under the scalp proximate to the treatment or monitoring site. In one embodiment, the invention is directed to a method that includes making an incision in the scalp of a head of a patient to create a scalp flap, exposing a skull beneath the scalp flap, creating a pocket between the scalp and the skull, and placing at least a portion of a low-profile IMD in the pocket. The low-profile IMD may include a plurality of modules, covered in part by a flexible overmold.
公开/授权文献
- US20040173221A1 Implantation of low-profile implantable medical device 公开/授权日:2004-09-09
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