Invention Grant
- Patent Title: Pad conditioner and method
- Patent Title (中): 垫调节剂和方法
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Application No.: US12636644Application Date: 2009-12-11
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Publication No.: US08398463B2Publication Date: 2013-03-19
- Inventor: Rajeev Bajaj
- Applicant: Rajeev Bajaj
- Agency: SNR Denton US LLP
- Main IPC: B24B1/00
- IPC: B24B1/00

Abstract:
A polishing pad conditioning apparatus includes a laser beam generating unit for providing a laser beam, a fluid delivery system for providing a fluid stream and a vacuum line for removing debris. The laser beam may directly impinge on a surface of a polishing pad thereby creating cutting action, while an atomized fluid stream provides cooling and pad debris along with fluid are removed thru the vacuum line. Alternatively, the laser beam may be combined with the atomized fluid stream in a region above the pad surface to substantially impart part of its energy to the fluid stream, generating high energy droplets which provide “cool” cutting action on the pad surface.
Public/Granted literature
- US20110143640A1 PAD CONDITIONER AND METHOD Public/Granted day:2011-06-16
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