Invention Grant
US08398783B2 Workpiece de-chucking device of plasma reactor for dry-cleaning inside of reaction chamber and electrostatic chuck during workpiece de-chucking, and workpiece de-chucking method using the same
有权
用于在工件脱夹中的反应室和静电吸盘内部进行干洗的等离子体反应器的工件脱夹装置，以及使用其的工件脱扣方法
- Patent Title: Workpiece de-chucking device of plasma reactor for dry-cleaning inside of reaction chamber and electrostatic chuck during workpiece de-chucking, and workpiece de-chucking method using the same
- Patent Title (中): 用于在工件脱夹中的反应室和静电吸盘内部进行干洗的等离子体反应器的工件脱夹装置，以及使用其的工件脱扣方法
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Application No.: US12854545Application Date: 2010-08-11
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Publication No.: US08398783B2Publication Date: 2013-03-19
- Inventor: Byoungil Lee , Hyeokjin Jang , Sungyong Ko , Minshik Kim
- Applicant: Byoungil Lee , Hyeokjin Jang , Sungyong Ko , Minshik Kim
- Applicant Address: KR Suwon
- Assignee: DMS Co., Ltd.
- Current Assignee: DMS Co., Ltd.
- Current Assignee Address: KR Suwon
- Agency: IPLA P.A.
- Agent James E. Bame
- Priority: KR10-2009-0083252 20090904
- Main IPC: B08B3/00
- IPC: B08B3/00
Abstract:
A workpiece de-chucking device of a plasma reactor for dry-cleaning the inside of a reaction chamber and an ElectroStatic chuck (ESC) during workpiece de-chucking and a workpiece de-chucking method using the same are provided. The workpiece de-chucking device includes a lifting unit, an ICP source power unit, and a controller. The lifting unit lifts a workpiece mounted on a top surface of an ESC. The ICP source power unit forms a magnetic field in an inductive coil arranged outside a dielectric window. The controller outputs a source power control signal, a lift control signal, and a de-chucking control signal.
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