Invention Grant
US08399278B2 Capacitive micromachined ultrasonic transducer and manufacturing method 有权
电容式微加工超声波换能器及其制造方法

Capacitive micromachined ultrasonic transducer and manufacturing method
Abstract:
The integrated circuit/transducer device of the preferred embodiment includes a substrate, a complementary-metal-oxide-semiconductor (CMOS) circuit that is fabricated on the substrate, and a capacitive micromachined ultrasonic transducer (cMUT) element that is also fabricated on the substrate. The CMOS circuit and cMUT element are fabricated during the same foundry process and are connected. The cMUT includes a lower electrode, an upper electrode, a membrane structure that support the upper electrode, and a cavity between the upper electrode and lower electrode.
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