- 专利标题: Patterned wafer defect inspection system and method
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申请号: US11888827申请日: 2007-08-02
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公开(公告)号: US08401272B2公开(公告)日: 2013-03-19
- 发明人: Ajharali Amanullah , Lin Jing , Chunlin Luke Zeng
- 申请人: Ajharali Amanullah , Lin Jing , Chunlin Luke Zeng
- 申请人地址: SG Singapore
- 专利权人: ASTI Holdings Limited
- 当前专利权人: ASTI Holdings Limited
- 当前专利权人地址: SG Singapore
- 代理机构: Jackson Walker L.L.P.
- 代理商 Christopher J. Rourk
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A system for inspecting semiconductor devices is provided. The system includes a region system selecting a plurality of regions from a semiconductor wafer. A golden template system generates a region golden template for each region, such as to allow a die image to be compared to golden templates from a plurality of regions. A group golden template system generates a plurality of group golden templates from the region golden templates, such as to allow the die image to be compared to golden templates from a plurality of group golden templates.
公开/授权文献
- US20090034831A1 Patterned wafer defect inspection system and method 公开/授权日:2009-02-05
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