Invention Grant
- Patent Title: Controlling plating stub reflections in a chip package
- Patent Title (中): 控制芯片封装中的电镀短截线反射
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Application No.: US12979745Application Date: 2010-12-28
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Publication No.: US08402406B2Publication Date: 2013-03-19
- Inventor: Moises Cases , Bhyrav M. Mutnury , Nanju Na , Terence Rodrigues
- Applicant: Moises Cases , Bhyrav M. Mutnury , Nanju Na , Terence Rodrigues
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Biggers & Ohanian, LLP
- Agent H. Barrett Spraggins; Thomas E. Tyson
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F9/455 ; H01L23/02 ; H01L21/00 ; H01R9/00

Abstract:
Methods, apparatuses, and computer program products are disclosed for controlling plating stub reflections in a chip package. In one embodiment, a resonance optimizer determines performance characteristics of a bond wire that connects a chip to a substrate of a semiconductor chip mount. In this embodiment, the resonance optimizer selects, based on the performance characteristics of the bond wire, a line width for an open-ended plating stub that extends from a signal interconnect of the substrate to a periphery of the substrate, The resonance optimizer also generates a design of signal traces for the substrate, where the signal traces include the open-ended plating stub with the selected line width.
Public/Granted literature
- US20120167033A1 Controlling Plating Stub Reflections In A Chip Package Public/Granted day:2012-06-28
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