Invention Grant
- Patent Title: Tunnel field-effect transistor with gated tunnel barrier
- Patent Title (中): 具有门控隧道势垒的隧道场效应晶体管
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Application No.: US13353607Application Date: 2012-01-19
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Publication No.: US08404545B2Publication Date: 2013-03-26
- Inventor: William G. Vandenberghe , Anne S. Verhulst
- Applicant: William G. Vandenberghe , Anne S. Verhulst
- Applicant Address: BE Leuven BE Leuven
- Assignee: IMEC,Katholieke Universiteit Leuven, K.U. Leuven R&D
- Current Assignee: IMEC,Katholieke Universiteit Leuven, K.U. Leuven R&D
- Current Assignee Address: BE Leuven BE Leuven
- Agency: Knobbe Martens Olson & Bear, LLP
- Priority: EP07010947 20070604
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A tunnel field effect transistor (TFET) is disclosed. In one aspect, the transistor comprises a gate that does not align with a drain, and only overlap with the source extending at least up to the interface of the source-channel region and optionally overlaps with part of the channel. Due to the shorter gate, the total gate capacitance is reduced, which is directly reflected in an improved switching speed of the device. In addition to the advantage of an improved switching speed, the transistor also has a processing advantage (no alignment of the gate with the drain is necessary), as well as a performance improvement (the ambipolar behavior of the TFET is reduced).
Public/Granted literature
- US20120115296A1 TUNNEL FIELD-EFFECT TRANSISTOR WITH GATED TUNNEL BARRIER Public/Granted day:2012-05-10
Information query
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