发明授权
- 专利标题: Method for producing photovoltaic cell
- 专利标题(中): 光电池生产方法
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申请号: US13298475申请日: 2011-11-17
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公开(公告)号: US08404599B2公开(公告)日: 2013-03-26
- 发明人: Youichi Machii , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi , Akihiro Orita , Tetsuya Satou , Keiko Kizawa
- 申请人: Youichi Machii , Masato Yoshida , Takeshi Nojiri , Kaoru Okaniwa , Mitsunori Iwamuro , Shuuichirou Adachi , Akihiro Orita , Tetsuya Satou , Keiko Kizawa
- 申请人地址: JP Tokyo
- 专利权人: Hitachi Chemical Company, Ltd.
- 当前专利权人: Hitachi Chemical Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Miles and Stockbridge P.C.
- 主分类号: H01L21/31
- IPC分类号: H01L21/31
摘要:
The method for producing a photovoltaic cell includes applying, on a partial region of one surface side of a semiconductor substrate, a first n-type diffusion layer forming composition including an n-type impurity-containing glass powder and a dispersion medium; applying, on at least a region other than the partial region on the surface of the semiconductor substrate, a second n-type diffusion layer forming composition which includes an n-type impurity-containing glass powder and a dispersion medium and in which a concentration of the n-type impurity is lower than that of the first n-type diffusion layer forming composition, where the first n-type diffusion layer forming composition is applied; heat-treating the semiconductor substrate on which the first n-type diffusion layer forming composition and the second n-type diffusion layer forming composition are applied to form an n-type diffusion layer; and forming an electrode on the partial region.
公开/授权文献
- US20120122263A1 METHOD FOR PRODUCING PHOTOVOLTAIC CELL 公开/授权日:2012-05-17
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