发明授权
- 专利标题: Polymer and process for producing the same, composition for forming insulating film, and insulating film and method of forming the same
- 专利标题(中): 聚合物及其制造方法,用于形成绝缘膜的组合物和绝缘膜及其形成方法
-
申请号: US12717225申请日: 2010-03-04
-
公开(公告)号: US08404786B2公开(公告)日: 2013-03-26
- 发明人: Masahiro Akiyama , Takahiko Kurosawa , Hisashi Nakagawa , Atsushi Shiota
- 申请人: Masahiro Akiyama , Takahiko Kurosawa , Hisashi Nakagawa , Atsushi Shiota
- 申请人地址: JP Tokyo
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2004-051733 20040226
- 主分类号: C08G77/60
- IPC分类号: C08G77/60
摘要:
A process for producing a polymer includes mixing (A) a polysiloxane compound and (B) a polycarbosilane compound in the presence of a catalyst, water, and an organic solvent, and heating the mixture.