发明授权
- 专利标题： Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method
- 专利标题（中）： 用于去除光刻设备的未封装多层反射镜上的沉积的方法，光刻设备和器件制造方法
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申请号： US12997149申请日： 2009-06-09
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公开(公告)号： US08405051B2公开(公告)日： 2013-03-26
- 发明人: Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
- 申请人： Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2009/057097 WO 20090609
- 国际公布： WO2010/006847 WO 20100121
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A method for removal of a deposition on an uncapped multilayer mirror of an apparatus. The method includes providing a gas that includes one or more of H2, D2, and DH, and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the apparatus; producing hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas; and bringing the uncapped multilayer mirror with deposition into contact with at least part of the hydrogen and/or deuterium radicals and the radicals of the one or more additional compounds to remove at least part of the deposition.