发明授权
US08407629B2 Pattern verification-test method, optical image intensity distribution acquisition method, and computer program
有权
模式验证测试方法，光学图像强度分布采集方法和计算机程序
- 专利标题： Pattern verification-test method, optical image intensity distribution acquisition method, and computer program
- 专利标题（中）： 模式验证测试方法，光学图像强度分布采集方法和计算机程序
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申请号： US13491639申请日： 2012-06-08
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公开(公告)号： US08407629B2公开(公告)日： 2013-03-26
- 发明人: Masamitsu Itoh , Satoshi Tanaka
- 申请人： Masamitsu Itoh , Satoshi Tanaka
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2008-162508 20080620
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A pattern verification-test method according to an embodiment of the present invention includes: deriving an illumination condition at a verification-test subject position in a photomask surface of a mask pattern as a verification or a test subject based on the verification-test subject position and illumination condition information about a distribution of an illumination condition in a photomask surface of exposure light incident on the mask pattern, performing lithography simulation on the mask pattern based on the derived illumination condition and the mask pattern, and verifying or testing the mask pattern based on a result of the lithography simulation.
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