Invention Grant
US08409488B2 Nano impression lithographic process which involves the use of a die having a region able to generate heat
有权
涉及使用具有能够产生热量的区域的模具的纳米压印平版印刷工艺
- Patent Title: Nano impression lithographic process which involves the use of a die having a region able to generate heat
- Patent Title (中): 涉及使用具有能够产生热量的区域的模具的纳米压印平版印刷工艺
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Application No.: US10562014Application Date: 2004-06-22
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Publication No.: US08409488B2Publication Date: 2013-04-02
- Inventor: Tormen Massimo
- Applicant: Tormen Massimo
- Applicant Address: IT Genoa
- Assignee: Consiglio Nazionale Delle Ricerche-INFM Istituto Nazion
- Current Assignee: Consiglio Nazionale Delle Ricerche-INFM Istituto Nazion
- Current Assignee Address: IT Genoa
- Agency: Sughrue Mion, PLLC
- Priority: ITTO2003A0473 20030623
- International Application: PCT/IB2004/002120 WO 20040622
- International Announcement: WO2004/114017 WO 20041229
- Main IPC: B29C55/00
- IPC: B29C55/00

Abstract:
A lithographic process for forming a pattern in relief (20) on a mass (10) of polymeric material comprises the steps of: preparing the mass (10) of polymeric material and a die (12) having a surface region (14) facing towards the mass (10) of polymeric material and which reproduces in negative the pattern in relief (20); heating the die (12) and putting the mass (10) of polymeric material into contact with the die (12) in any temporal sequence, in such a way that the part of the mass (10) of polymeric material in contact with the surface zone (14) is subject to softening; and separating the die (12) from the mass (10) of polymeric material on the surface of which the pattern in relief (20) has been formed. The heating of at least one part of the die (12) is obtained by generation of thermal energy upon dissipation of another form of energy in at least one region (16) of the die (12).
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