发明授权
US08409788B2 Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same
有权
激光感应热成像方法,使用该方法的有机层图案化方法以及使用其制造有机发光二极管显示装置的方法
- 专利标题: Laser induced thermal imaging method, method of patterning organic layer using the same and method of fabricating organic light emitting diode display device using the same
- 专利标题(中): 激光感应热成像方法,使用该方法的有机层图案化方法以及使用其制造有机发光二极管显示装置的方法
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申请号: US12912243申请日: 2010-10-26
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公开(公告)号: US08409788B2公开(公告)日: 2013-04-02
- 发明人: Hyun-Chul Lee , Jin-Han Park , Hyung-Sik Kim , Won-Kyu Lim , Cheol-Lae Roh
- 申请人: Hyun-Chul Lee , Jin-Han Park , Hyung-Sik Kim , Won-Kyu Lim , Cheol-Lae Roh
- 申请人地址: KR Yongin-si
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR Yongin-si
- 代理机构: Christie, Parker & Hale, LLP
- 优先权: KR10-2009-0116424 20091130
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A laser induced thermal imaging (LITI) method, a method of patterning an organic layer using the same and a method of manufacturing an organic light emitting diode (OLED) display device using the same. The LITI method includes preparing a substrate including a transfer layer, preparing a donor substrate including a base film and a light-to-heat conversion layer disposed on the base film, aligning the substrate with the donor substrate, and irradiating laser to the base layer of the donor substrate. Here, the laser is irradiated to the base layer in a region excluding a region corresponding to a pattern to be formed on the substrate. Thus, according to the method, regardless of the size of the pattern to be formed and the size of the laser beam, stitching mura can be prevented.
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