发明授权
US08410465B2 Apparatus and method for inspecting defects of a circuit pattern formed on a substrate using a laser and a non-contact capacitor sensor
失效
使用激光和非接触式电容传感器来检查形成在基板上的电路图案的缺陷的装置和方法
- 专利标题： Apparatus and method for inspecting defects of a circuit pattern formed on a substrate using a laser and a non-contact capacitor sensor
- 专利标题（中）： 使用激光和非接触式电容传感器来检查形成在基板上的电路图案的缺陷的装置和方法
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申请号： US12716948申请日： 2010-03-03
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公开(公告)号： US08410465B2公开(公告)日： 2013-04-02
- 发明人: Seung Seoup Lee , Jae Cheon Doh , In Kyung Park
- 申请人： Seung Seoup Lee , Jae Cheon Doh , In Kyung Park
- 申请人地址： KR Suwon, Gyunggi-do
- 专利权人： Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人： Samsung Electro-Mechanics Co., Ltd.
- 当前专利权人地址： KR Suwon, Gyunggi-do
- 代理机构： Blakely Sokoloff Taylor & Zafman LLP
- 优先权： KR10-2009-0118701 20091202
- 主分类号： G01N21/86
- IPC分类号： G01N21/86
摘要：
An apparatus for inspecting defects in a circuit pattern is described. The apparatus includes at least one laser unit for radiating a laser beam onto a first end of a circuit pattern formed on a substrate. The apparatus also includes a capacitor sensor disposed opposite a second end of the circuit pattern, which is connected to the first end of the circuit pattern through a via hole, in a non-contact manner. The apparatus also includes a voltage source connected to the capacitor sensor and configured to apply a voltage. The apparatus also includes a measurement unit connected to the capacitor sensor and configured to detect variation in impedance generated in the capacitor sensor.
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