发明授权
- 专利标题： Mask system employing substantially circular optical proximity correction target and method of manufacture thereof
- 专利标题（中）： 采用基本圆形光学邻近校正目标的掩模系统及其制造方法
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申请号： US12465431申请日： 2009-05-13
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公开(公告)号： US08413083B2公开(公告)日： 2013-04-02
- 发明人: Sia Kim Tan , Gek Soon Chua , Kwee Liang Martin Yeo , Ryan Khoon Khye Chong , Moh Lung Ling
- 申请人： Sia Kim Tan , Gek Soon Chua , Kwee Liang Martin Yeo , Ryan Khoon Khye Chong , Moh Lung Ling
- 申请人地址： SG Singapore
- 专利权人： Globalfoundries Singapore Pte. Ltd.
- 当前专利权人： Globalfoundries Singapore Pte. Ltd.
- 当前专利权人地址： SG Singapore
- 代理机构： Ishimaru & Associates LLP
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.
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