- 专利标题： Process of producing liquid discharge head base material
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申请号： US12871233申请日： 2010-08-30
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公开(公告)号： US08415178B2公开(公告)日： 2013-04-09
- 发明人: Souta Takeuchi , Masaya Uyama , Hirokazu Komuro
- 申请人： Souta Takeuchi , Masaya Uyama , Hirokazu Komuro
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Canon U.S.A., Inc. IP Division
- 优先权： JP2009-204640 20090904
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; H01L21/50 ; H01L21/48 ; H01L21/44
摘要：
A process includes preparing a base material having a first surface provided with an element generating energy that is used for discharging a liquid and an electrode layer that is connected to the element; forming a hollow on a second surface, which is the surface on the opposite side of the first surface, of the base material, wherein part of the electrode layer serves as the bottom face of the hollow; covering the surface of the base material and the bottom face forming the inner face of the hollow with an insulating film; and partially exposing the electrode layer by removing part of the insulating film covering the bottom face using laser light.
公开/授权文献
- US08445298B2 Process of producing liquid discharge head base material 公开/授权日：2013-05-21
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