发明授权
US08415729B2 Power device with trenched gate structure and method of fabricating the same
有权
具有沟槽栅极结构的功率器件及其制造方法
- 专利标题: Power device with trenched gate structure and method of fabricating the same
- 专利标题(中): 具有沟槽栅极结构的功率器件及其制造方法
-
申请号: US13081500申请日: 2011-04-07
-
公开(公告)号: US08415729B2公开(公告)日: 2013-04-09
- 发明人: Tieh-Chiang Wu , Yi-Nan Chen , Hsien-Wen Liu
- 申请人: Tieh-Chiang Wu , Yi-Nan Chen , Hsien-Wen Liu
- 申请人地址: TW Kueishan, Tao-Yuan Hsien
- 专利权人: Nanya Technology Corp.
- 当前专利权人: Nanya Technology Corp.
- 当前专利权人地址: TW Kueishan, Tao-Yuan Hsien
- 代理商 Winston Hsu; Scott Margo
- 主分类号: H01L27/108
- IPC分类号: H01L27/108
摘要:
A power device with trenched gate structure, includes: a substrate having a first face and a second face opposing to the first face, a body region of a first conductivity type disposed in the substrate, a base region of a second conductivity type disposed in the body region, a cathode region of the first conductivity type disposed in the base region, an anode region of the second conductivity type disposed in the substrate at the second face a trench disposed in the substrate and extending from the first face into the body region, and the cathode region encompassing the trench, wherein the trench has a wavelike sidewall, a gate structure disposed in the trench and an accumulation region disposed in the body region and along the wavelike sidewall. The wavelike sidewall can increase the base current of the bipolar transistor and increase the performance of the IGBT.
公开/授权文献
信息查询
IPC分类: