发明授权
- 专利标题: Pattern forming method
- 专利标题(中): 图案形成方法
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申请号: US12884617申请日: 2010-09-17
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公开(公告)号: US08419950B2公开(公告)日: 2013-04-16
- 发明人: Hiroyuki Kashiwagi , Kazuya Fukuhara
- 申请人: Hiroyuki Kashiwagi , Kazuya Fukuhara
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 优先权: JP2009-219689 20090924
- 主分类号: B44C1/22
- IPC分类号: B44C1/22
摘要:
According to one embodiment, a pattern forming method is disclosed. The method includes contacting a template with light curable resin on a substrate. The template comprises a concave-convex pattern including concave portions and convex portions, and a metal layer provided on a convex portion of the concave-convex pattern. The concave-convex pattern is to be contacted with the light curable resin. The pattern forming method further includes irradiating the light curable resin with light of a predetermined wavelength under a condition ε1=−2ε2. Where ε1 is a complex relative permittivity of the metal layer corresponding to the predetermined wavelength, ε2 is a complex relative permittivity of the light curable resin corresponding to the predetermined wavelength.
公开/授权文献
- US20110068081A1 Pattern Forming Method 公开/授权日:2011-03-24
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