发明授权
- 专利标题: Semiconductor chip structure
- 专利标题(中): 半导体芯片结构
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申请号: US11769736申请日: 2007-06-28
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公开(公告)号: US08421227B2公开(公告)日: 2013-04-16
- 发明人: Mou-Shiung Lin , Jin-Yuan Lee
- 申请人: Mou-Shiung Lin , Jin-Yuan Lee
- 申请人地址: TW Hsinchu
- 专利权人: Megica Corporation
- 当前专利权人: Megica Corporation
- 当前专利权人地址: TW Hsinchu
- 代理机构: Seyfarth Shaw LLP
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
A semiconductor chip structure includes a semiconductor substrate, an circuit structure, a passivation layer, a first adhesion/barrier layer, a metal cap and a metal layer. The semiconductor substrate has multiple electric devices located on a surface layer of a surface of the substrate. The circuit structure had multiple circuit layers electrically connecting with each other and electrically connecting with the electric devices. One of the circuit layers has multiple pads. The passivation layer is located on the circuit structure and has multiple openings penetrating through the passivation layer. The openings expose the pads. The first adhesion/barrier layer is over the pads and the passivation layer. The metal cap is located on the first adhesion/barrier layer and the passivation layer. The metal layer is on the metal layer.
公开/授权文献
- US20080042280A1 Semiconductor chip structure 公开/授权日:2008-02-21
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