Invention Grant
- Patent Title: Semiconductor chip structure
- Patent Title (中): 半导体芯片结构
-
Application No.: US11769736Application Date: 2007-06-28
-
Publication No.: US08421227B2Publication Date: 2013-04-16
- Inventor: Mou-Shiung Lin , Jin-Yuan Lee
- Applicant: Mou-Shiung Lin , Jin-Yuan Lee
- Applicant Address: TW Hsinchu
- Assignee: Megica Corporation
- Current Assignee: Megica Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Seyfarth Shaw LLP
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A semiconductor chip structure includes a semiconductor substrate, an circuit structure, a passivation layer, a first adhesion/barrier layer, a metal cap and a metal layer. The semiconductor substrate has multiple electric devices located on a surface layer of a surface of the substrate. The circuit structure had multiple circuit layers electrically connecting with each other and electrically connecting with the electric devices. One of the circuit layers has multiple pads. The passivation layer is located on the circuit structure and has multiple openings penetrating through the passivation layer. The openings expose the pads. The first adhesion/barrier layer is over the pads and the passivation layer. The metal cap is located on the first adhesion/barrier layer and the passivation layer. The metal layer is on the metal layer.
Public/Granted literature
- US20080042280A1 Semiconductor chip structure Public/Granted day:2008-02-21
Information query
IPC分类: