Invention Grant
- Patent Title: Fluid handling structure, lithographic apparatus and device manufacturing method
- Patent Title (中): 流体处理结构，光刻设备和器件制造方法
-
Application No.: US12437433Application Date: 2009-05-07
-
Publication No.: US08421993B2Publication Date: 2013-04-16
- Inventor: Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Koen Steffens , Arnold Jan Van Putten
- Applicant: Daniel Jozef Maria Direcks , Danny Maria Hubertus Philips , Clemens Johannes Gerardus Van Den Dungen , Maikel Adrianus Cornelis Schepers , Paul Petrus Joannes Berkvens , Koen Steffens , Arnold Jan Van Putten
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
Public/Granted literature
- US20090279062A1 FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-11-12
Information query
