发明授权
- 专利标题： Lithographic apparatus
- 专利标题（中）： 平版印刷设备
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申请号： US12872842申请日： 2010-08-31
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公开(公告)号： US08421996B2公开(公告)日： 2013-04-16
- 发明人: Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov , Rudolf Kemper , Joost Jeroen Ottens
- 申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov , Rudolf Kemper , Joost Jeroen Ottens
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/32
摘要：
A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
公开/授权文献
- US20100321653A1 LITHOGRAPHIC APPARATUS 公开/授权日：2010-12-23