发明授权
- 专利标题: Ink-jet ink composition for etching resist
- 专利标题(中): 用于蚀刻抗蚀剂的喷墨油墨组合物
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申请号: US12933938申请日: 2009-01-27
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公开(公告)号: US08425790B2公开(公告)日: 2013-04-23
- 发明人: Masaki Sato , Seiju Suzuki , Shuichi Sugita , Kenichi Kaneda , Shigenori Kobayashi
- 申请人: Masaki Sato , Seiju Suzuki , Shuichi Sugita , Kenichi Kaneda , Shigenori Kobayashi
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Nisshin Steel Co., Ltd.,Tokyo Printing Ink Mfg. Co., Ltd.
- 当前专利权人: Nisshin Steel Co., Ltd.,Tokyo Printing Ink Mfg. Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Kubotera & Associates, LLC
- 优先权: JP2008-084470 20080327; JP2008-216909 20080826
- 国际申请: PCT/JP2009/000309 WO 20090127
- 国际公布: WO2009/118976 WO 20091001
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; C08F2/46
摘要:
An ink composition for ink jet printing is provided which gives a cured object excellent in adhesion to metallic plates, resistance to etchants, and alkali removability and can be stably ejected with an ink jet apparatus. The ink jet composition for etching resists has a viscosity at 25° C. of 3-50 mPa s and includes monomers comprising: either a polymerizable phosphoric ester compound represented by general formula (I); a polyfunctional monomer having two or more ethylenic double-bond groups per molecule and having no phosphoric ester group, the content of the ethylenic double-bond groups being 4×10−3 to 8×10−3 mol/g; and a monofunctional monomer having one ethylenic double-bond group per molecule and having neither phosphoric ester group nor carboxy group. In the formula, X represents C1-3 alkylene, Y represents C2-3 alkylene, and R represents hydrogen or methyl.
公开/授权文献
- US20110024392A1 INK-JET INK COMPOSITION FOR ETCHING RESIST 公开/授权日:2011-02-03
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