发明授权
- 专利标题: Array substrate and method for manufacturing the same
- 专利标题(中): 阵列基板及其制造方法
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申请号: US13150389申请日: 2011-06-01
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公开(公告)号: US08426259B2公开(公告)日: 2013-04-23
- 发明人: Xiang Liu , Seongyeol Yoo , Jianshe Xue
- 申请人: Xiang Liu , Seongyeol Yoo , Jianshe Xue
- 申请人地址: CN Beijing
- 专利权人: Beijing BOE Optoelectronics Technology Co., Ltd.
- 当前专利权人: Beijing BOE Optoelectronics Technology Co., Ltd.
- 当前专利权人地址: CN Beijing
- 代理机构: Ladas & Parry LLP
- 优先权: CN201010197076 20100603
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L29/06
摘要:
The present invention provides an array substrate, comprising: a base substrate; a pixel electrode pattern and a gate pattern formed on the base substrate, the gate pattern comprises a gate scanning line and a gate electrode of a transistor, both of the gate scanning line and the gate electrode comprise transparent conductive metal layer and the gate metal layer stacking on the substrate, each pixel electrode in the pixel electrode pattern comprises transparent conductive metal layer; a gate insulating layer on the pixel electrode pattern and the gate pattern, an active layer pattern on the gate insulating layer and corresponding to the gate electrode, a via hole in the gate insulating layer for exposing the pixel electrode; and a source/drain pattern on the gate insulating layer, the source/drain pattern comprises a data scanning line crossing with the gate scanning line, source and drain electrodes of the transistor, and the drain electrode is in contact with the pixel electrode through the via hole.
公开/授权文献
- US20110297929A1 ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME 公开/授权日:2011-12-08
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