发明授权
- 专利标题: Dual-pattern coloring technique for mask design
- 专利标题(中): 面罩设计的双色彩着色技术
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申请号: US13087324申请日: 2011-04-14
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公开(公告)号: US08429574B2公开(公告)日: 2013-04-23
- 发明人: Min Cao , Jeffrey Markham
- 申请人: Min Cao , Jeffrey Markham
- 申请人地址: unknown San Jose
- 专利权人: Cadence Design Systems, Inc.
- 当前专利权人: Cadence Design Systems, Inc.
- 当前专利权人地址: unknown San Jose
- 代理机构: Kenyon & Kenyon LLP
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
A hierarchical schematic design editor displays mask layers for each shape as mask specific colors and alerts a user to mask layer conflicts during the design and editing process. According to an embodiment, mask colors may be assigned at the time the shapes or geometries and cells are placed in a circuit design layout, or when a mask layer condition indicating that two or more shapes should be set to different mask layers is detected. In an embodiment, if the distance between two shapes is less than a predetermined threshold, those shapes may cause a mask layer condition. Shapes may be grouped to facilitate mask layer condition detection and mask layer assignment.
公开/授权文献
- US20120266110A1 DUAL-PATTERN COLORING TECHNIQUE FOR MASK DESIGN 公开/授权日:2012-10-18
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