发明授权
- 专利标题: Dual beam apparatus with tilting sample stage
- 专利标题(中): 具有倾斜样品台的双光束装置
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申请号: US12731910申请日: 2010-03-25
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公开(公告)号: US08431891B2公开(公告)日: 2013-04-30
- 发明人: Hiroyasu Shichi , Satoshi Tomimatsu , Noriyuki Kaneoka , Kaoru Umemura , Koji Ishiguro
- 申请人: Hiroyasu Shichi , Satoshi Tomimatsu , Noriyuki Kaneoka , Kaoru Umemura , Koji Ishiguro
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2006-072600 20060316
- 主分类号: G01N23/00
- IPC分类号: G01N23/00 ; G21K7/00
摘要:
An ion beam processing apparatus includes an ion beam irradiation optical system that irradiate a rectangular ion beam to a sample held on a first sample stage, an electron beam irradiation optical system that irradiates an electron beam to the sample, and a second sample stage on which a test piece, extracted from the sample by a probe, is mounted. An angle of irradiation of the ion beam can be tilted by rotating the second sample stage about a tilting axis. A controller controls the width of skew of an intensity profile representing an edge of the rectangular ion beam in a direction perpendicular to a first direction in which the tilting axis of the second sample stage is projected on the second sample stage surface so that the width will be smaller than the width of skew of an intensity profile representing another edge of the ion beam in a direction parallel to the first direction.
公开/授权文献
- US20100176297A1 ION BEAM PROCESSING APPARATUS 公开/授权日:2010-07-15
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