发明授权
- 专利标题: Particle beam treatment device and irradiation dose setting method of the particle beam treatment device
- 专利标题(中): 粒子束处理装置和粒子束处理装置的照射剂量设定方法
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申请号: US13318866申请日: 2011-03-08
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公开(公告)号: US08431907B2公开(公告)日: 2013-04-30
- 发明人: Masahiro Ikeda , Hisashi Harada , Osamu Takahashi
- 申请人: Masahiro Ikeda , Hisashi Harada , Osamu Takahashi
- 申请人地址: JP Chiyoda-Ku, Tokyo
- 专利权人: Mitsubishi Electric Corporation
- 当前专利权人: Mitsubishi Electric Corporation
- 当前专利权人地址: JP Chiyoda-Ku, Tokyo
- 代理机构: Buchanan Ingersoll & Rooney PC
- 国际申请: PCT/JP2011/055347 WO 20110308
- 国际公布: WO2012/120636 WO 20120913
- 主分类号: G01J1/42
- IPC分类号: G01J1/42 ; A61N5/00 ; G21G5/00
摘要:
A particle beam treatment device includes an irradiation nozzle which moves a particle beam in a direction which is perpendicular to an advancing direction; a dose monitor which measures the dose of the particle beam; a planning part which sets the irradiation dose applied to a target volume; and a controlling part which controls the irradiation dose applied to a target volume based on irradiation dose set value which is set by a value measured by the dose monitor and the planning part, wherein the planning part stores the absorbed dose distribution data in the depth direction which is prepared in advance using the absorbed dose at the reference depth which is a predetermined position nearer to an incident side of the particle beam than the position of Bragg peak as the reference and calculates the irradiation dose set value using the absorbed dose at the reference depth.
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