发明授权
- 专利标题: Charged particle beam apparatus permitting high resolution and high-contrast observation
- 专利标题(中): 带电粒子束装置允许高分辨率和高对比度观察
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申请号: US13551452申请日: 2012-07-17
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公开(公告)号: US08431915B2公开(公告)日: 2013-04-30
- 发明人: Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi
- 申请人: Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Stites & Harbison PLLC
- 代理商 Juan Carlos A. Marquez, Esq.
- 优先权: JP2008-104232 20080414
- 主分类号: A61N5/00
- IPC分类号: A61N5/00 ; G21G5/00
摘要:
A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.
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