Invention Grant
- Patent Title: Method for generating nano patterns upon material surfaces
- Patent Title (中): 在材料表面上产生纳米图案的方法
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Application No.: US12431213Application Date: 2009-04-28
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Publication No.: US08434221B2Publication Date: 2013-05-07
- Inventor: Yeau-Ren Jeng , Chung-Ming Tan
- Applicant: Yeau-Ren Jeng , Chung-Ming Tan
- Applicant Address: TW Chia-Yi
- Assignee: National Chung Cheng University
- Current Assignee: National Chung Cheng University
- Current Assignee Address: TW Chia-Yi
- Agency: WPAT, P.C.
- Agent Anthony King
- Priority: TW97116328A 20080502
- Main IPC: H01R9/00
- IPC: H01R9/00 ; H05K3/00

Abstract:
The present invention discloses a method for generating nano patterns upon material surfaces. The method for generating nano patterns upon material surfaces comprises the following steps: providing a thin film capable of controlling lattice directions, applying a nanoindentation action to the thin film to generate an indentation at a specific position on the thin film. At least one hillock is then generated in a specific direction to generate a pattern and to be applied to a data storage system.
Public/Granted literature
- US20090272172A1 METHOD FOR GENERATING NANO PATTERNS UPON MATERIAL SURFACES Public/Granted day:2009-11-05
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