发明授权
- 专利标题: Method to manufacture a circuit apparatus having a rounded differential pair trace
- 专利标题(中): 制造具有圆形差动对迹线的电路装置的方法
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申请号: US12870072申请日: 2010-08-27
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公开(公告)号: US08434222B2公开(公告)日: 2013-05-07
- 发明人: Matthew S. Doyle , Joseph Kuczynski , Kevin A. Splittstoesser , Timothy J. Tofil
- 申请人: Matthew S. Doyle , Joseph Kuczynski , Kevin A. Splittstoesser , Timothy J. Tofil
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Owen J. Gamon
- 主分类号: H05K3/02
- IPC分类号: H05K3/02 ; H05K3/10
摘要:
A first artwork layer having a first adaptable-mask section allows a graded amount of light to pass into an underlying first photoresist layer. Subsequent to developing the first photoresist layer, the graded amount of light creates a rounded geometric void used as a mold or sidewall for the creation of at least a lower portion of a rounded trace. A dielectric layer is laminated upon the lower portion and a second artwork layer having an second adaptable-mask section allows a graded amount of light to pass into a second photoresist layer. Subsequent to developing the second photoresist layer, the graded amount of light creates a rounded geometric void used as a mold or sidewall for the creation of at least an upper portion of a rounded trace. The photoresist and dielectric layers are removed resulting in a circuit apparatus having a rounded differential pair trace.