发明授权
- 专利标题: Nonvolatile semiconductor memory device and method for manufacturing same
- 专利标题(中): 非易失性半导体存储器件及其制造方法
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申请号: US12839784申请日: 2010-07-20
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公开(公告)号: US08436416B2公开(公告)日: 2013-05-07
- 发明人: Daigo Ichinose , Tadashi Iguchi
- 申请人: Daigo Ichinose , Tadashi Iguchi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2009-263830 20091119
- 主分类号: H01L27/115
- IPC分类号: H01L27/115 ; H01L21/8246
摘要:
According to one embodiment, a nonvolatile semiconductor memory device includes a substrate, a stacked body, a plurality of semiconductor pillars and a charge storage film. The stacked body is provided on the substrate, with a plurality of insulating films alternately stacked with a plurality of electrode films, and includes a hydrophobic layer provided between one of the insulating films and one of the electrode films. The hydrophobic layer has higher hydrophobicity than the electrode films. The plurality of semiconductor pillars extend in a stacking direction of the stacked body and pierce the stacked body, and the charge storage film is provided between the electrode films and one of the semiconductor pillars.
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