发明授权
- 专利标题: Exposure apparatus, and device manufacturing method
- 专利标题(中): 曝光装置和装置制造方法
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申请号: US12923718申请日: 2010-10-05
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公开(公告)号: US08436979B2公开(公告)日: 2013-05-07
- 发明人: Akimitsu Ebihara
- 申请人: Akimitsu Ebihara
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2003-174259 20030619
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/52
摘要:
An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. Substrates can be held on first and second tables. The first and second tables are moved together so as to transit from a first state to a second state, the first state in which the liquid immersion is maintained between the projection system and one of the first and second tables, the second state in which the liquid immersion is maintained between the projection system and the other one of the first and second tables. During the transition, the liquid immersion is maintained just below the projection system.
公开/授权文献
- US20110025997A1 Exposure apparatus, and device manufacturing method 公开/授权日:2011-02-03
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