发明授权
- 专利标题: Optical system, exposure system, and exposure method
- 专利标题(中): 光学系统,曝光系统和曝光方法
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申请号: US10587254申请日: 2005-01-14
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公开(公告)号: US08436983B2公开(公告)日: 2013-05-07
- 发明人: Yasuhiro Omura
- 申请人: Yasuhiro Omura
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2004-018226 20040127; JP2004-338749 20041124
- 国际申请: PCT/JP2005/000406 WO 20050114
- 国际公布: WO2005/071718 WO 20050804
- 主分类号: G02B5/30
- IPC分类号: G02B5/30 ; G03B27/32 ; G03B27/42 ; G03B27/52 ; G03B27/54 ; G03B27/72
摘要:
An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A light beam of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
公开/授权文献
- US20070296941A1 Optical System, Exposure System, and Exposure Method 公开/授权日:2007-12-27
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