Invention Grant
- Patent Title: Protection layer for adhesive material at wafer edge
- Patent Title (中): 在晶片边缘的粘合剂材料保护层
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Application No.: US13560200Application Date: 2012-07-27
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Publication No.: US08441136B2Publication Date: 2013-05-14
- Inventor: Wen-Chih Chiou , Weng-Jin Wu , Shau-Lin Shue
- Applicant: Wen-Chih Chiou , Weng-Jin Wu , Shau-Lin Shue
- Applicant Address: TW
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW
- Agency: Lowe Hauptman Ham & Berner, LLP
- Main IPC: H01L23/29
- IPC: H01L23/29

Abstract:
This description relates to a semiconductor device including a wafer having a first surface and a second surface opposite to the first surface and a carrier attached to the first surface of the wafer by an adhesive layer, a portion of the adhesive layer adjacent to an edge of the wafer is exposed. The semiconductor device further includes a protection layer to cover the exposed portion of the adhesive layer. The semiconductor device further includes a plurality of dies attached to the second surface and a molding compound encapsulating the plurality of dies.
Public/Granted literature
- US20120292783A1 PROTECTION LAYER FOR ADHESIVE MATERIAL AT WAFER EDGE Public/Granted day:2012-11-22
Information query
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