Invention Grant
- Patent Title: Multi-beam interferometer displacement measuring system utilized in a large measuring range
- Patent Title (中): 多光束干涉仪位移测量系统用于大量程
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Application No.: US12926697Application Date: 2010-12-06
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Publication No.: US08441649B2Publication Date: 2013-05-14
- Inventor: Yung-Cheng Wang , Lih-Horng Shyu , Chung-Ping Chang , Pi-Cheng Tung
- Applicant: Yung-Cheng Wang , Lih-Horng Shyu , Chung-Ping Chang , Pi-Cheng Tung
- Applicant Address: TW Douliou, Yunlin County
- Assignee: National Yunlin University of Science and Technology
- Current Assignee: National Yunlin University of Science and Technology
- Current Assignee Address: TW Douliou, Yunlin County
- Agency: Bacon & Thomas, PLLC
- Priority: TW98144696A 20091224
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
A multi-beam interferometer displacement measuring system has a light source module, a resonator module and a detecting device. The light source module has an emitter and a polaroid sheet. The emitter emits a non-polarizing beam. The polaroid sheet receives and transforms the non-polarizing beam into a polarizing beam. The resonator module receives the polarizing beam and has a coated glass panel, a corner cube prism and a wave-delay plate. The coated glass panel receives and reflects the polarizing beam. The corner cube prism receives and reflects the polarizing beam to the coated glass panel to form a resonant cavity. The wave-delay plate is mounted between the coated glass panel and the corner cube prism to receive the polarizing beam. The detecting device faces the coated glass panel to receive the interferential stripes formed in the resonator module and has a polarizing beam splitter, two power detectors and a signal processor.
Public/Granted literature
- US20110157598A1 Multi-beam interferometer displacement measuring system utilized in a large measuring range Public/Granted day:2011-06-30
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