Invention Grant
- Patent Title: Film forming apparatus and method for forming film
- Patent Title (中): 成膜装置及成膜方法
-
Application No.: US12035663Application Date: 2008-02-22
-
Publication No.: US08443753B2Publication Date: 2013-05-21
- Inventor: Hideki Tanaka , Hideo Shimamura
- Applicant: Hideki Tanaka , Hideo Shimamura
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2007-044474 20070223
- Main IPC: B05B3/00
- IPC: B05B3/00 ; B05B7/16 ; B05C5/00 ; B05D1/02

Abstract:
A film forming apparatus includes a processing chamber defined by walls, an application preparation room in which an applicator is temporary provided, a first carrier transporting the applicator from the application preparation room to the processing chamber, a stage on which a substrate is disposed and a maintenance part disposed adjacent to the application preparation room. A liquid is applied from the applicator onto the substrate to form a film on the substrate.
Public/Granted literature
- US20080206472A1 FILM FORMING APPARATUS AND METHOD FOR FORMING FILM Public/Granted day:2008-08-28
Information query