Invention Grant
- Patent Title: Method of patterning of nanostructures
- Patent Title (中): 纳米结构图案化方法
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Application No.: US12918842Application Date: 2009-02-23
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Publication No.: US08445889B2Publication Date: 2013-05-21
- Inventor: Kumar Bhupendra , Yuanyuan Zhang , Zongbin Wang , Lain-Jong Li , Subodh Gautam Mhaisalkar
- Applicant: Kumar Bhupendra , Yuanyuan Zhang , Zongbin Wang , Lain-Jong Li , Subodh Gautam Mhaisalkar
- Applicant Address: SG Singapore
- Assignee: Nanyang Technological University
- Current Assignee: Nanyang Technological University
- Current Assignee Address: SG Singapore
- Agency: Dickstein Shapiro LLP
- International Application: PCT/SG2009/000064 WO 20090223
- International Announcement: WO2009/105045 WO 20090827
- Main IPC: H01L29/06
- IPC: H01L29/06
Abstract:
A method of patterning nanostructures comprising printing an ink comprising the nanostructures onto a solvent-extracting first surface such that a pattern of nanostructures is formed on the first surface.
Public/Granted literature
- US20110001118A1 PATTERNING OF NANOSTRUCTURES Public/Granted day:2011-01-06
Information query
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