Invention Grant
- Patent Title: Non-resonant two-photon absorption recording material and non-resonant two-photon absorption compound
- Patent Title (中): 非共振双光子吸收记录材料和非共振双光子吸收复合物
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Application No.: US13579578Application Date: 2011-02-18
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Publication No.: US08449794B2Publication Date: 2013-05-28
- Inventor: Eri Takahashi , Masaharu Akiba , Hiroaki Tsuyama , Hidehiro Mochizuki
- Applicant: Eri Takahashi , Masaharu Akiba , Hiroaki Tsuyama , Hidehiro Mochizuki
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-033910 20100218; JP2010-220085 20100929
- International Application: PCT/JP2011/054212 WO 20110218
- International Announcement: WO2011/102545 WO 20110825
- Main IPC: F21V9/00
- IPC: F21V9/00 ; G02B5/02 ; G02C7/10 ; G02F1/361 ; G03B11/00 ; C07C255/00 ; C07C49/00
Abstract:
A non-resonant two-photon absorption recording material containing at least (a) a non-resonant two-photon absorption compound, and (b) a recording component in which at least either a refractive index or fluorescence intensity changes, wherein the non-resonant two-photon absorption compound (a) is a compound having a structure represented by formula (1) as described.
Public/Granted literature
- US20120319059A1 NON-RESONANT TWO-PHOTON ABSORPTION RECORDING MATERIAL AND NON-RESONANT TWO-PHOTON ABSORPTION COMPOUND Public/Granted day:2012-12-20
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