发明授权
US08454846B1 Method and system for providing a full wrap-around shield using a frame configured wet etch in a damascene process
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用于在镶嵌过程中使用框架配置的湿法蚀刻来提供全包裹屏蔽的方法和系统
- 专利标题: Method and system for providing a full wrap-around shield using a frame configured wet etch in a damascene process
- 专利标题(中): 用于在镶嵌过程中使用框架配置的湿法蚀刻来提供全包裹屏蔽的方法和系统
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申请号: US12817376申请日: 2010-06-17
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公开(公告)号: US08454846B1公开(公告)日: 2013-06-04
- 发明人: Ronghui Zhou , Ming Jiang , Danning Yang , Yun-Fei Li
- 申请人: Ronghui Zhou , Ming Jiang , Danning Yang , Yun-Fei Li
- 申请人地址: US CA Fremont
- 专利权人: Western Digital (Fremont), LLC
- 当前专利权人: Western Digital (Fremont), LLC
- 当前专利权人地址: US CA Fremont
- 主分类号: B44C1/22
- IPC分类号: B44C1/22 ; G11B5/31
摘要:
A method and system for fabricating magnetic recording transducer are described. The magnetic recording transducer has a main pole including a plurality of sides, an intermediate layer adjacent to the sides of the main pole, and a field region distal from the main pole. The method and system include providing at least one trench in the intermediate layer. The trench(es) are between the main pole and the field region. The method and system also include providing a stop layer. A portion of the stop layer resides in at least part of the trench(es) and on at least part of the field region. The method and system also include removing a portion of the intermediate layer using a wet etch. The stop layer is resistant to removal by the wet etch. The method and system also include depositing a full wrap-around shield layer on the main pole.
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