Invention Grant
US08456226B2 Method and system for a process sensor to compensate SoC parameters in the presence of IC process manufacturing variations
失效
用于在存在IC工艺制造变化的情况下补偿SoC参数的过程传感器的方法和系统
- Patent Title: Method and system for a process sensor to compensate SoC parameters in the presence of IC process manufacturing variations
- Patent Title (中): 用于在存在IC工艺制造变化的情况下补偿SoC参数的过程传感器的方法和系统
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Application No.: US13545580Application Date: 2012-07-10
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Publication No.: US08456226B2Publication Date: 2013-06-04
- Inventor: Stephen Chi-Wang Au , Arya Behzad , Paul Chang
- Applicant: Stephen Chi-Wang Au , Arya Behzad , Paul Chang
- Applicant Address: US CA Irvine
- Assignee: Broadcom Corporation
- Current Assignee: Broadcom Corporation
- Current Assignee Address: US CA Irvine
- Agency: Thomas|Horstemeyer, LLP
- Main IPC: G05F3/02
- IPC: G05F3/02

Abstract:
Certain aspects of a method and system for a process sensor to compensate SoC parameters in the presence of IC process manufacturing variations are disclosed. Aspects of one method may include determining an amount of process variation associated with at least one transistor within a single integrated circuit. The determined amount of process variation may be compensated by utilizing a process dependent current, a bandgap current, and a current associated with a present temperature of the transistor. The process dependent current, the bandgap current and the current associated with the present temperature of the transistor may be combined to generate an output current. A voltage generated across a variable resistor may be determined based on the generated output current.
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