One embodiment relates to a memory device. The memory device includes a capacitor having a first capacitor plate and a second capacitor plate, wherein the first and second capacitor plates are separated by an insulating layer and are formed over a first portion of a semiconductor substrate. The memory device also includes a transistor having a source region, a drain region, and a gate region, where the gate region is coupled to the second capacitor plate. The transistor is formed over a second portion of the semiconductor substrate. A well region is disposed in the first and second portions of the semiconductor substrate and has a doping-type that is opposite a doping-type of the semiconductor substrate. Other embodiments are also disclosed.