发明授权
- 专利标题: Manufacturing method for electrooptic element and optical deflector including electrooptic element
- 专利标题(中): 包括电光元件的电光元件和光偏转器的制造方法
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申请号: US13227018申请日: 2011-09-07
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公开(公告)号: US08463082B2公开(公告)日: 2013-06-11
- 发明人: Jun Nakagawa , Koichiro Nakamura , Shuichi Suzuki
- 申请人: Jun Nakagawa , Koichiro Nakamura , Shuichi Suzuki
- 申请人地址: JP Tokyo
- 专利权人: Ricoh Company, Ltd.
- 当前专利权人: Ricoh Company, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2010-204137 20100913
- 主分类号: G02F1/295
- IPC分类号: G02F1/295
摘要:
An electrooptic element includes an optical waveguide layer made from a ferroelectric material and having a polarization inverted region of a predetermined shape having an optical incidence face and an optical exit face, and an upper electrode layer and a lower electrode layer formed on a top face and a bottom face of the optical waveguide layer, respectively, in which the ferroelectric material is magnesium-oxide-doped lithium niobate, and at least one of the optical incidence face and the optical exit face of the optical waveguide layer is formed in parallel with a crystal face of the ferroelectric material.
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