发明授权
US08464760B2 Valve unit, reaction apparatus with the same, and method of forming valve in channel
有权
阀门单元,具有相同的反应装置,以及在通道中形成阀的方法
- 专利标题: Valve unit, reaction apparatus with the same, and method of forming valve in channel
- 专利标题(中): 阀门单元,具有相同的反应装置,以及在通道中形成阀的方法
-
申请号: US11770762申请日: 2007-06-29
-
公开(公告)号: US08464760B2公开(公告)日: 2013-06-18
- 发明人: Jong-myeon Park , Jeong-gun Lee
- 申请人: Jong-myeon Park , Jeong-gun Lee
- 申请人地址: KR Suwon-Si
- 专利权人: Samsung Electronic Co., Ltd.
- 当前专利权人: Samsung Electronic Co., Ltd.
- 当前专利权人地址: KR Suwon-Si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2006-0077127 20060816; KR10-2006-0092926 20060925
- 主分类号: F15C1/04
- IPC分类号: F15C1/04
摘要:
A valve unit, a reaction apparatus with the same, and a method of forming a valve by injecting a valve material into a channel are provided. The valve unit comprises a fluid channel constituting a flow path of a fluid and having a portion containing a first area of a first dimension (“D1”) and a second area of a second dimension (“D2”), wherein D1