发明授权
US08466039B2 Pressurized treatment of substrates to enhance cleaving process 失效
加压处理底物以增强切割过程

Pressurized treatment of substrates to enhance cleaving process
摘要:
A method of cleaving a substrate is disclosed. A species, such as hydrogen or helium, is implanted into a substrate to form a layer of microbubbles. The substrate is then annealed a pressure greater than atmosphere. This annealing may be performed in the presence of the species that was implanted. This diffuses the species into the substrate. The substrate is then cleaved along the layer of microbubbles. Other steps to form an oxide layer or to bond to a handle also may be included.
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