Invention Grant
- Patent Title: Charged particle beam drawing apparatus and control method thereof
- Patent Title (中): 带电粒子束描绘装置及其控制方法
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Application No.: US13163111Application Date: 2011-06-17
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Publication No.: US08466440B2Publication Date: 2013-06-18
- Inventor: Jun Yashima , Yasuo Kato , Akihito Anpo
- Applicant: Jun Yashima , Yasuo Kato , Akihito Anpo
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-149000 20100630
- Main IPC: G21K5/10
- IPC: G21K5/10 ; G03F7/00
Abstract:
A charged particle beam drawing apparatus applies a predetermined dose of a charged particle beam for drawing patterns corresponding to figures included in a drawing data, in a whole of a drawing area of a workpiece, before a result of calculation of a fogging effect correction dose is obtained, wherein a proximity effect correction dose is incorporated in the predetermined dose, and the fogging effect correction dose is not incorporated in the predetermined dose, then, the charged particle beam drawing apparatus applies a predetermined dose of the charged particle beam for drawing the patterns which overlap the patterns drawn before the result of calculation of the fogging effect correction dose is obtained, in the whole of the drawing area of the workpiece, after the calculation of the fogging effect correction dose, wherein the proximity effect correction dose and the fogging effect correction dose are incorporated in the predetermined dose.
Public/Granted literature
- US20120001097A1 CHARGED PARTICLE BEAM DRAWING APPARATUS AND CONTROL METHOD THEREOF Public/Granted day:2012-01-05
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