发明授权
- 专利标题: Method for fabricating phase change memory device using solid state reaction
- 专利标题(中): 使用固态反应制造相变存储器件的方法
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申请号: US13110579申请日: 2011-05-18
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公开(公告)号: US08470719B2公开(公告)日: 2013-06-25
- 发明人: Seung Yun Lee , Young Sam Park , Sung Min Yoon , Soon Won Jung , Byoung Gon Yu
- 申请人: Seung Yun Lee , Young Sam Park , Sung Min Yoon , Soon Won Jung , Byoung Gon Yu
- 申请人地址: KR Daejeon
- 专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人地址: KR Daejeon
- 优先权: KR2007-127534 20071210; KR2007-84534 20080828
- 主分类号: H01L21/461
- IPC分类号: H01L21/461 ; H01L21/06
摘要:
Provided are a nonvolatile memory device and a method of fabricating the same, in which a phase-change layer is formed using a solid-state reaction to reduce a programmable volume, thereby lessening power consumption. The device includes a first reactant layer, a second reactant layer formed on the first reactant layer, and a phase-change layer formed between the first and second reactant layers due to a solid-state reaction between a material forming the first reactant layer and a material forming the second reactant layer. The phase-change memory device consumes low power and operates at high speed.
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