Invention Grant
- Patent Title: Varistor and method for manufacturing varistor
- Patent Title (中): 压敏电阻及其制造方法
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Application No.: US13545505Application Date: 2012-07-10
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Publication No.: US08471673B2Publication Date: 2013-06-25
- Inventor: Hitoshi Tanaka , Katsunari Moriai , Takahiro Itami
- Applicant: Hitoshi Tanaka , Katsunari Moriai , Takahiro Itami
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2011-160028 20110721
- Main IPC: H01C7/10
- IPC: H01C7/10

Abstract:
A varistor is provided with a varistor element body, a plurality of internal electrodes arranged in the varistor element body so as to sandwich a partial region of the varistor element body between them, and a plurality of external electrodes arranged on the surface of the varistor element body and connected to the corresponding internal electrodes. The external electrode has a sintered electrode layer formed by attaching an electroconductive paste containing an alkali metal to the surface of the varistor element body and sintering it. The varistor element body has a high-resistance region formed by diffusing the alkali metal in the electroconductive paste into the varistor element body from an interface between the surface of the varistor element body and the sintered electrode layer.
Public/Granted literature
- US20130021133A1 VARISTOR AND METHOD FOR MANUFACTURING VARISTOR Public/Granted day:2013-01-24
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