Invention Grant
- Patent Title: Refractive index distribution measuring method and refractive index distribution measuring apparatus
- Patent Title (中): 折射率分布测量方法和折射率分布测量装置
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Application No.: US13511460Application Date: 2011-05-19
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Publication No.: US08472014B2Publication Date: 2013-06-25
- Inventor: Tomohiro Sugimoto
- Applicant: Tomohiro Sugimoto
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2010-119558 20100525
- International Application: PCT/JP2011/062041 WO 20110519
- International Announcement: WO2011/149000 WO 20111201
- Main IPC: G01N21/41
- IPC: G01N21/41 ; G01B9/00

Abstract:
A method includes measuring a transmitted wavefront of a test object by introducing reference light into the test object arranged in a medium having a refractive index different from a refractive index of the test object, and calculating a refractive index distribution of the test object by using a measurement result of the transmitted wavefront. The measuring step measures a first transmitted wavefront for a first wavelength and a second transmitted wavefront for a second wavelength different from the first wavelength. The calculating step calculates the refractive index distribution of the test object by removing a shape component of the test object utilizing measurement results of the first and the second transmitted wavefront, and a transmitted wavefront of a reference object arranged in the medium for each of the first and second wavelengths. The reference object has the same shape as the test object and a specific refractive index distribution.
Public/Granted literature
- US20120241989A1 REFRACTIVE INDEX DISTRIBUTION MEASURING METHOD AND REFRACTIVE INDEX DISTRIBUTION MEASURING APPARATUS Public/Granted day:2012-09-27
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